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The Micro standard stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns (vertical line gratings, horizontal line gratings, pillar arrays and hole arrays) at 4 different dimensions (1 µm, 5 µm, 10 µm, 50 µm). All patterns are half-pitch patterns. The stamp is offered in Silicon and the size of the stamp is 20 mm x 20 mm.

Stamp ID MSS_V1
Stamp size 20 mm x 20 mm
Stamp material Silicon
Stamp thickness 1 mm
Structure size 1 µm - 50 µm
Etch depth 2 µm, 5 µm or 10 µm
Pattern field size 4 mm x 4 mm
Delivery time 3-4 weeks
Anti-sticking layer (ASL) and dicing are optional

Micro Standard Stamp

Examples of patterns and features
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