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The Micro standard stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns (vertical line gratings, horizontal line gratings, pillar arrays and hole arrays) at 4 different dimensions (1 µm, 5 µm, 10 µm, 50 µm). All patterns are half-pitch patterns. The stamp is offered in Silicon and the size of the stamp is 20 mm x 20 mm.
Specifications
| Stamp size |
20 mm x 20 mm |
| Stamp material |
Silicon |
| Stamp thickness |
1 mm |
| Structure size |
1 µm - 50 µm |
| Etch depth |
2 µm, 5 µm or 10 µm |
| Pattern field size |
4 mm x 4 mm |
| Delivery time |
3-4 weeks |
Anti-sticking layer (ASL) and dicing are optional
Examples
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Micro Standard Stamp
Examples of patterns and features
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Related information
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