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Nanolithosolution’s Nanoimprint Technology Platform (NTP) is a standalone nanoimprint system for UV NIL, including a nanoimprint module with AutoRelease™ function, an automatic imprint controller and a customized LED UV exposure source and controller. The NTP provides interfaces for customized configurations like imaging systems, external probes etc. The system provides a state of the art nanoimprint solution for anyone familiar with traditional UV photolithography.
Advantages of the NLS UV Nanoimprint System
- Simple and robust process: Proven through the use in research of world-leading institutions.
- Alignment: Mask alignment is limited only by imaging subsystem capability.
- Easy to use: A person familiar with semiconductor processes can be trained in a few hours.
- Upgradable functions with many options available in the future.
- Customizable by users: The system provides a platform for many user customization functions.
Use the Nanoimprint Technology Platform to make working stamps
The NTP uses a 5 inch x 5 inch photomask based stamp format. Included with the NTP is a Quick Polymer Stamp (QPS) technology to make polymer working stamps from standard silicon masters. The QPS are made on a 5 inch x 5 inch photo mask blank where the stamp structures are then defined on top in the QPS polymer using a silicon master in the NTP. See examples at the bottom of page.
Application areas
- Optical devices
- Displays
- Data storage
- Biotech
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- Semiconductor ICs
- Chemical synthesis
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Advanced materials
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Etc.
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Examples
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NLS UV Imprint System
Various images of the NLS UV Imprint System |
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Imprint on GaAs Substrate
Imprint of 100 nm lines on a 350 µm thick GaAs substrate using QPS™
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