Direct Laser writing is useful to create patterns with dimensions larger than about 1 µm. It is much faster than e-beam and no photomask is required. Since no photomask is required it has a fast turnaround for a laser based lithography. The alignment precision is better than can be achieved with regular mask aligners.
We provide laser writing with masters of silicon, fused silica or nickel, based on direct laser and patter transfer by either etching or Ni-plating.
Specifications for laser written masters
|Master material:||Silicon and fused silica|
|Minimum dimension:||1 µm|
|Max substrate diameter:||Up to 9” square|
|Alignment precision||Around +/- 0.3 µm (depends on substrate size)|
|Lateral tolerance||+/- 150 nm|