Patterning and Lithography
At NIL Technology, our core competences lie within patterning and lithography. We use many different patterning and lithography techniques to create masters and device prototypes.
For example, Electron beam lithography (EBL) is used to create the finest of patterns and we can accurately define structures below 20 nm.
Deep UV lithography (DUV), also referred to as a DUV stepper, is used for structures typically larger than 250 nm, and where the structures are repeated across the wafer. For larger structures, typically more than a few microns, the structures are defined by UV lithography (UVL) or laser writing.
You are welcome to contact us if you would like to know more about our patterning and lithography services. You can read more about the different services on their dedicated pages.