SPIE presentation – Meta optical elements produced by nanoimprint lithography

Presentation at SPIE Advanced Lithography + Patterning,
April 28, 2022.
Brian Bilenberg, Founder & Executive VP Mastering

PIE Advanced Lithography + Patterning

NILT will be present at SPIE Advanced Lithography + Patterning on April 28, 2022, in San Jose, California, where Brian Bilenberg, Founder & Executive VP Mastering at NILT, will give a talk with the headline:

Meta optical elements produced by nanoimprint lithography.

We hope to see you there!

About the presentation

Meta optics is recognized as a pioneering technology with massive potential. Instead of the curved surface of a traditional refractive lens element, meta optical elements (MOEs) – also known as metalenses – are entirely flat but effectively create the same optical function. They bend and redirect the light, using a single MOE in place of several refractive lenses stacked on top of each other in many optical systems today.

For the last 20 years, most work in meta optics has been concentrated in academia. Now, the Danish optical solutions company NIL Technology (NILT) is commercializing the metalens technology by structuring all processes for mass production.

In this talk, Brian Bilenberg, Founder and Executive VP Mastering will talk about why E-beam lithography (EBL) combined with nanoimprint lithography (NIL) is the best approach to developing and mass-producing high-quality, low-cost meta optical elements.

PIE Advanced Lithography + Patterning
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