Projector & Illuminator Solutions
Diffusers, custom-built dot-projectors,
and integrated multiple-functionality optics.
Prototyping & manufacturing services for customer-designed optics.
Fit for applications in Depth sensing, AR/MR, Eye-tracking, Automotive DMS/OMS, LiDAR, Face recognition, and Health Monitoring
NTLight® technology brings significant value to a range of applications.
The MP-ready DOE catalog of diffusers includes elements that start from 63°x56° and go to 82°x72°, with multiple elements with a field of illumination in between.
- Standalone Diffusers deliver low-module height, high optical efficiency for energy saving, and low zero order.
- Pair diffusers with collimators for a sharp illumination intensity profile.
- Our DOE is polymer on glass substrates.
Contact us to learn more about how NILT can help enhance your solution or develop new products.
Diffuser Intensity maps and profiles
Diffuser intensity map with batwing profile (horizontal and vertical cross-section) obtained with uncollimated VCSEL illumination.
NILT offers high-performance projector architectures.
- DOE dot projectors exhibit good efficiency and uniformity, enabling them for a range of applications
- DOE collimators deliver precise control of effective focal lengths and low unit-to-unit variation compared to refractive collimators, facilitating module assembly.
Reach out to us to customize dot projectors to your requirements and application.
Integrated and advanced optics
NILT NTLight® offers multiple functional parts integrated side-by-side on the same substrate. This capability can deliver
- Multiple fields of illumination of the same element
- Diffuser and Fanout on the same element
- Different collimators on the same element
- Ask us about other multi-functional requirements
NTLight is NILT’s state-of-the-art technology for transmit-side applications.
NTLight gives you innovative possibilities with unique flat optics compared to classical refractive optics.
High precision masters
NTLight® DOE technology uses “best-in-class” e-beam lithography expertise to create binary, 4-level, 8-level, and higher levels of DOE structures.
An established replication process
Our nanoimprint replication is established for mass production and verified in a Time-of-Flight (ToF) component.
New features, New trade space
New technologies bring new features and new tradeoffs compared to classical refractive solutions. NILT’s fast prototyping helps our customers learn by prototyping.
Exploit the new space for your application as it continues to evolve and deliver more design freedom over the conventional refractive lens and MLA solutions.
Diffractive optical elements created with e-beam lithography and replicated with nano-replication
NILT offers fabrication services with DOEs and MLAs. We replicate your designs using our qualified materials.
Reach out to learn more.
Would you like to know more?
Read articles on NILT's Tx solutions
Scaling metalenses for mass manufacturing
Cover story at Laser Focus World, May 2022, focusing on how the combination of nanoimprint lithography with e-beam lithography enables the fabrication of high-quality, low-cost meta-optical elements in batch sizes suitable for mass manufacturing.
VCSELs and Flat Optics — A Gamechanger For ToF Applications
Article in Photonics Online on the advantage of combining VCSELs and flat optics into a compact illumination module.
What can Flat Optics Do for Depth Sensing?
Article in Photonics Online on flat optics for depth sensing. Depth measurements and design considerations of depth measurement systems are discussed.