NIL Technology offers a micro standard stamp that is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns (vertical line gratings, horizontal line gratings, pillar arrays and hole arrays) at 4 different dimensions (1 µm, 5 µm, 10 µm, 50 µm). All patterns are half-pitch patterns. The stamp is offered in silicon and the size of the stamp is 20 mm x 20 mm.

The micro standard stamp can be delivered with or without anti-sticking coating

Specifications for Micro standard stamp

Stamp IDMSS_V1
Stamp size20 mm x 20 mm
Stamp materialSilicon
Stamp thickness1 mm
Structure size1 µm – 50 µm
Etch depth2 µm, 5 µm or 10 µm
Pattern field size4 mm x 4 mm
Delivery time3-4 weeks
Anti-sticking layer (ASL) and dicing are optional

Examples - Micro Standard Stamp

Examples of patterns and features