NIL Technology offers a micro-test standard stamp that consists of 9 identically patterned areas arranged in a 3 x 3 array. The structures on the stamp are line gratings with line widths of 3 µm, 5 µm, 10 µm and 20 µm with line/space ratios of 1:1, 1:2 and 1:3. The dimensions and ratios make it straight forward to do inspection after imprint using conventional microscopy and stylus profilometry. Thus, the micro-test standard stamp is very suitable for imprint and replication process optimization.

The micro-test standard stamp can be delivered with or without anti-sticking coating

Specifications for Micro-Test standard stamp

Stamp size100 mm diameter with a flat (SEMI standard wafer)
Stamp materialSilicon
Stamp thickness525 µm
Structure size3 µm, 5 µm, 10 µm, 20 µm
Structure shapeLine gratings
Structure height300 nm

Examples - Micro Test Standard Stamp

Design specifications