Large Area Pillar

NIL Technology offers a large area pillar standard stamp with a total active area of 4 cm 2 . The large area pillar standard stamp is a high-quality standard stamp in silicon with 4 different active areas, each 1 cm 2 , with square arranged pillar arrays with pitches from 200 nm to 500 nm with lateral dimensions of the pillars from 125 nm to 275 nm. The height of the pillars can be chosen by the customer to be between 100 nm and 300 nm.

The large area pillar standard stamp can be delivered with or without anti-sticking coating

Specifications for Large Area Pillar standard stamp

Stamp IDLAPSS_V1
Stamp size2 inch round wafer
Stamp materialSilicon
Stamp thickness525 µm +/- 25 µm
Structure size125 nm, 175 nm, 225 nm, 275 nm (rounded squares)
Structure pitch200 nm, 300 nm, 400 nm, 500 nm
Protrusion height100 nm – 300 nm (you decide!)
Tolerance, lateral and vertical dimensions+/- 15%
Defect densityLess than 0.1% of total patterned area
Anti-sticking layer (ASL) and dicing are optional
 

Examples - Large Area Pillar Standard Stamp

Different examples of patterns and features