Silicon Nanoimprint Lithography masters

NIL Technology produces silicon masters with customer specified structures for nano- and micro replication and nanoimprint lithography. The silicon masters can be patterned by Electron Beam Lithography, DUV lithography, mask less lithography, direct laser writing and UV contact lithography. Our silicon masters can be delivered in standard wafer formats, 2”, 4”, 6” and 8”, or a shape-cut from standard wafers formats. Moreover, we can supply silicon masters for step-and-repeat tools.

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Silicon masters and how we can help

NIL Technology are experts in the production of silicon nanoimprint lithography masters with binary diffraction gratings. We can create large areas with multi-level structures of 4 or more levels. We also make blazed gratings, (often refered to as saw-tooth gratings), and slanted gratings.

You can read more about different types of structures here

We make advanced structures according to your specifications if needed. Contact us for more information.

Use of silicon masters

Silicon masters can be used directly in the replication process or to generate working molds. They can also be used to produce working molds for mass production by replication or nanoimprint lithography. This can be done within a large variety of applications like advanced optics, displays, sensors, waveguides, time-of-flight, meta structures and lenses etc.

Specifications of silicon masters

I
Material
Silicon
Size (wafer)
2″, 4″, 6″, 8″
Sizes (cut)
Any format cut from a wafer format
Thickness
Typically, standard wafer thicknesses (custom thicknesses upon request)
Minimum lateral dimensions
20 nm
Aspect ratio
Up to 1:10 (pattern dependent)
Design
Customer specified
Design file format
gds, dxf, tdb
Anti-sticking
FDTS (optional)
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