Fused Silica/Quartz Nanoimprint Lithography masters

NIL Technology has extensive expertise in the production of fused silica and quartz masters. The masters have specified custom structures that are made for nanoimprint lithography and replication.

The fused silica masters can be patterned by electron beam lithography, DUV lithography, maskless lithography, direct laser writing and UV contact lithography. Our masters can be delivered in standard wafer formats, 2”, 4”, 6” and 8”, or any a shape cut from standard wafer formats.

Fused Silica master

Fused Silica/quartz masters and how we can help

We make fused silica masters with binary diffraction gratings. These gratings can be made over large areas. Please contact us for more information.

We can produce microlens arrays (MLA) and multilevel structures with 4 or more levels and we have the capacity to produce more advanced structures, if your application requires this.

Contact us to get more information about this matter.

Use of fused silica/quartz masters

Fused silica/quartz masters are used directly in the replication process or to generate working molds. They can also be used to produce working molds for mass production by replication or nanoimprint lithography. This can be done within a large variety of applications like advanced optics, waveguides, displays, sensors, time-of-flight, meta structures and lenses etc.

Specifications for our fused silica/quartz masters:

Fused silica (quartz)
Size (wafer)
2″, 4″, 6″, 8″
Sizes (cut)
Any format cut from wafers
Typically 0,5 mm, 1 mm or 2 mm (other upon request)
Minimum lateral dimensions
20 nm
Aspect ratio
Up to 1:5 (pattern dependent)
Customer specified
Design file format
gds, dxf, tdb
FDTS (optional)
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