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Fused Silica NIL Stamps

 
    
 
Fused silica / quartz stamps can be supplied with any design specified by customers. The fused silica stamps are patterned using electron beam lithography, UV lithography or nanoimprint lithography (NIL). The fused silica stamps can be delivered in wafer formats or cut into any square or rectangular shape.
 
Fused silica stamps can be used as master molds for the fabrication of polymer replicates. Most typically fused silica stamps are used for UV NIL.
 
NILT supplies fused silica stamps for many applications such as: SAW devices, meta materials and diffractive gratings.
 
Specifications:
 
Stamp material
Fused silica (Quartz)
Stamp sizes (wafer)
2", 4", 6"
Stamp sizes (square)
Any format cut from wafers
Stamp thickness
1 mm (other upon request)
Minimum lateral dimension
20 nm
Aspect ratio
Up to 1:5 (pattern dependent)
Design
Customer specified
Design file format
gds, dxf, tdb
Anti-sticking
FDTS (optional)
Delivery time
Typically 4 weeks
 
 
 
Examples
Fused Silica NIL Stamps
Different examples of patterns and features
Related information
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