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The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm. It has 8 areas with 5 different patterns, each with different line widths and periods. The stamp is offered in both Silicon and Quartz.

  • Cost-effective stamp for testing
  • Optimal for testing of the nanoimprint process and of NIL equipment
  • 8 active areas
  • 5 different patterns included (meanders, cross-bars, checkers, lines and pillars)
  • Line widths down to 50 nm
  • Suitable for UV and thermal NIL - choose between quartz and silicon
  • Fast delivery time of typically 3 weeks

Stamp size 2 inch round wafer
Stamp material Quartz (Fused Silica) or Silicon
Stamp thickness 500 µm +/- 25 µm
Structure size 50 nm - 300 nm
Protrusion height 100 nm +/- 15%
Line width tolerance 50 nm: +/- 30% , 100 nm: +/- 20%, 150-300 nm: +/- 15%
Defect density Less than 0.1% of total patterned area
Anti-sticking layer (ASL) and dicing are optional


Standard Stamp
Different examples of patterns and features
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