NILT offers electron beam lithography services based on a Jeol JBX 9500 FSZ system (backup system: Jeol JBX 9300 FS).
The minimum achieved linewidth is 10 nm on this system. The JBX 9500 FSZ is a 100 kV system with a writing field of 1,000 µm x 1,000 µm. The system can expose 50 mm, 100 mm, 150 mm and 200 mm wafers as well as 6025 and 65 mm x 65 mm mask blanks.
NILT also offers a wide variety of pre- and post-processing of wafers if required.
Design file requirements
In order to allow easy handling of design files in GDSII, DXF, TDB or CIF format, the design file must fulfill the following:
All design files handed over to NILT are kept strictly confidential and all design file data is deleted upon customer request.