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Nanoimprint Lithography (NIL)
NIL is a sub-100 nm lithography technique that works by physically deforming a thermoplastic material in a temperature and pressure controlled printing process.
Electron Beam Lithography (EBL)
Electron beam lithography is a versatile tool capable of making almost all kinds of patterns imaginable within nanotechnology. Electron beam lithography is a mask less lithography technique initially developed in the 1950s.
Laser Interference Lithography
Laser interference lithography is a pattern definition technique capable of defining micrometer and sub-micrometer large area periodic patterns.
Hot embossing is very similar to thermal nanoimprint lithography. Hot embossing is in contrary to thermal NIL characterized by structuring of polymer films that are much thicker than the height of the patterns being embossed.
Injection molding is by far the most successful volume production technology for plastic components which makes it interesting to explore in the context of micro and nanostructures.
The idea behind roll-2-roll imprinting is to implement all the advantages of nanoimprint lithography and hot embossing into a high volume production platform on large rolls of polymer thin film.
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