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The Microlens Array Standard Stamp contains closely packed microlens structures arranged in a honeycomb geometry with three dimensional intersections between the individual lenses.
Wire Grid Polarizer
The Wire Grid Polarizer Standard Stamp is ideal for production of wire grid polarizers by nanoimprint lithography for test purposes. The stamp features a large active area of 12 mm x 12 mm with 50 nm lines and spaces.
The Anti-Reflective Standard Stamp is a large area and cost-effective functional standard stamp in Nickel with a graded index profile and with a continuously changing effective refractive index.
The Sub-Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns at 4 different dimensions.
This stamp is well suited for process testing within the fields of nanoimprint lithography and hot embossing. The stamp features arrays of square pillars/holes having a size of 3, 5, 10 and 20 µm.
The 65 Standard Stamp is optimal for testing of the nanoimprint processes and testing of NIL equipment using this particular stamp format. The stamp comes with line widths down to 100 nm.
The Diffraction Grating standard stamps are large area stamps in Nickel with linear gratings or with crossed gratings. The pitch of the gratings is in both cases 500 nm and the average depth of the gratings is 250 nm.
Linear and Circular Engineered Diffusers
The ED standard stamp series is specifically designed as a set of multi-purpose engineered diffusers for R&D work, as well as for product and process development.
The Grating Standard Stamp is a low-cost standard stamp with periodic line and pillar grating patterns and customers can choose among different variants with different specifications.
The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm.
Large Area Pillar
The Large Area Pillar Standard Stamp is a high-quality standard stamp in Silicon with large patterned area of photonic crystal and anti-reflective structures. It has 4 areas, each 1 cm x 1 cm, with square arrays of pillars.
The Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 3 different patterns at 3 different dimensions.
The micro-needle standard stamp contains the inverse structure of micro-needles — i.e. micro-needle shaped holes. The micro-needle standard stamp can be used to produce micro-needles either by hot-embossing or casting.
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