Any Word
Exact search

References   Well-defined microapertures for ion channel biosensors E. Halža, T. H. Bro, B. Bilenberg, and A. Koçer Analytical Chemestry. 2013, 85, 811−815 DWDM laser arrays fabricated using thermal nanoimprint lithography on indium phosphide substrates K. Smistrup, O. Hansen, F. Khan, M. Emanuel, Y. Ma, Y. Zhang, A. Kristensen, S. Rishton The 57th annual conference on electron, ion, and photon beam technology and nanofacrication, EIPBN 2013 Simulation and experimental study of the effects of process factors on the uniformity of the residual layer thickness in hot embossing F. Omar, A. Kolew, E. B. Brousseau, H. Hirshy Journal of Micro- and Nano-Manufacturing, 2013 by ASME, Vol. 1 / 021002-1 Modeling the constitutive and frictional behavior of PTFE flexible stamps for NIL M.R. Sonne, J.H. Hattel Microelectronic Engineering 106 (2013) 1–8 Replication of large area nanoimprint stamp with small critical dimension loss M. FanTao, G. Le, W. ZhiWen, H. ZhiTao, C. JinKui Science China - Technological Sciences March 2012 Vol.55 No.3: 600–605 Microfluidic chip designs process optimization and dimensional quality control M. Calaon, H. N. Hansen, G. Tosello, J. Garnaes, J. Nørregaard, W. Li Journal Of Microsystem Technology - Heidelberg, December 3-5, 2012 Printing colour at the optical diffraction limit K. Kumar, H. Duan, R. Hegde, S. Koh, J. Wei, and J. Yang Nature Nanotechnology (2012). doi:10.1038/nnano.2012.128 Production quality control of microfluidic designs M. Calaon, H. N. Hansen, G. Tosello1, J. Garnaes, J. Nørregaard, M. Guttmann Microfluidics 2012 - Heidelberg A nanoporous silicon nitride membrane using a two-step lift-off pattern transfer with thermal nanoimprint lithography Bhargav P Nabar, Zeynep Celik-Butler, Brian H Dennis and Richard E Billol 2012 J. Micromech. Microeng. 22 045012 Optical properties of gold and aluminium nanoparticles for silicon solar cell applications T. L. Templea and D. M. Bagnall Journal of Applied Physics 109, 084343, 2011 Profiles of complex periodic structures determined by scatterometry P-E. Hansen, B. Bilenberg, Y. R. Shen and M. Karamehmedovic. Proceedings of the 13th International Confeence on Metrology and Properties of Engineering Surfaces, Twickenham Stadium, UK, April 2011 Vertical sidewall roughness measured by AFM and SEM Jørgen Garnæs, Brian Bilenberg, Radu Malureanu, Jacob Markussen Proceedings Nanoscale 2010 Direct replication of nanostructures from silicon wafers in polymethylpentene by injection molding R. Brucka, R. Hainbergera, R. Heera, N. Kataevaa, A. Köcka, M. Krapf-Güntherb, K. Kaiblingerb, F. Pipelkab,B. Bilenberg Proc. SPIE Optics + Photonics 2010 Microfabricated magnetic bead polydimethylsiloxane microarrays Jenny Aveyarda, Tobias Hedegaard, Brian Bilenberg and Dan V. Nicolaua, Microelectronic Engineering 2010 Formation of nanopatterned polymer blends in photovoltaic devices Ximin He, Feng Gao, Guoli Tu,David Hasko, Sven Huttner, Ullrich Steiner, Neil C. Greenham, Richard H. Friend, and Wilhelm T. S. Huck, Nano Letters, 2010 Nanopatterned polymethylpentene substrates fabricated by injection molding for biophotonic applications R. Hainberger, R. Brucka, N. Kataeva, R. Heer, A. Köck, P. Czepl, K. Kaiblinger, F. Pipelka and B. Bilenberg, Microelectronic Engineering, 2009 Industrial applications demanding low and high resolution features realized by soft UV-NIL and hot embossing R. Miller, T. Glinsner, G. Kreindl, P. Lindner, M. Wimplinger, SPIE Advanced Lithography Proceedings (7271) 2009 Design and fabrication using nanoimprint lithography of a nanofluidic device for DNA stretching applications E. Abad, S. Merino, A. Retolaza, A. Juarros, Microelectronic Engineering 85 (2008) 818–821. ICP etch processes for nanoimprint lithography C.C.Welch, B. Bilenberg, Proceedings PESM 2007 High-quality patterns produced by nanoimprint lithography and inductive coupled plasma etching B. Bilenberg, C. C. Welch, Proceedings MNE 2007

Copyright © NIL Technology - All Rights Reserved.

DANPAQ Web Content Management System by DAN.