Multi-Pattern

The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm. It has 8 areas with 5 different patterns, each with different line widths and periods. The stamp is offered in both Silicon and Quartz.

Stamp size	2 inch round wafer
Stamp material	Quartz (Fused Silica) or Silicon
Stamp thickness	500 µm +/- 25 µm
Structure size	50 nm - 300 nm
Protrusion height	100 nm +/- 15%
Line width tolerance	50 nm: +/- 30% , 100 nm: +/- 20%, 150-300 nm: +/- 15%
Defect density	Less than 0.1% of total patterned area

 

Anti-sticking layer (ASL) and dicing are optional

Examples

Multi-Pattern Standard Stamp   Different examples of patterns and features

 

Silicon NIL Stamps Fused Silica NIL Stamps Nickel Shims Anti-Reflective Standard Stamp Wire Grid Polarizer Standard Stamp Microlens Array Standard Stamp NIL Service EBL Service Thermal NIL Tool

Multi-Pattern Standard Stamp (PDF) Request Information / Prices