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NILT offers UV and thermal nanoimprint lithography and hot-embossing services based on commercially available nanoimprint lithography tools. Imprinting is offered on any substrate type and into any polymer material required.
Typical substrate types are Silicon, Fused Silica, III-V materials and polymer sheets and typical imprint polymers are PMMA, COC, COP, PC and PET. If required, NILT also offers pre and post processing of the substrates.
Available imprint technologies:
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UV NIL wafer scale
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Thermal NIL wafer scale
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UV NIL step and repeat
General specifications
| Stamp material |
Silicon, Fused silica, polymer, Nickel |
| Imprint resist |
Any resist specified by the customer |
| Anti-sticking coating |
FDTS |
| Min. resolution |
20 nm |
| Substrates |
2 inch, 4 inch, 6 inch wafers
Any odd shape that can be diced out of a 4 inch wafer
Polymer sheets |
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Related information
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