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NILT offers Electron Beam Lithography (EBL) services. NILT uses state-of-the-art EBL systems to ensure that customer specifications are fullfilled and that the EBL solution fits perfectly to customer needs. NILT offers to spin coat the EBL resist onto customer substrates and to develop the EBL resist. If suitable, NILT also offers dry etching or thinfilm deposition.
NILT uses the following EBL tools:
General specifications
| Feature sizes |
20 nm - 1 µm |
| Minimum CD |
20 nm |
| Substrate formats |
2", 4", 6" wafers (silicon or quartz); 65 mm x 65 mm x 6.35 mm; 6025 mask blanks |
| Design file formats |
GDSII, DXF (AutoCAD format) |
High Quality EBL service
NILT E-Beam Service is documented highest quality available. In example, a periodic grating pattern written to have a pitch of 100 nm was measured to have a pitch of 100.006 nm
+/- 0.022 nm. The measurement of the grating pitch uniformity was performed with a conventional non-contact Si cantilever probe mounted in a Metrological Large Range Scanning Probe Microscope.
On request, NILT can provide additional information -
How to get a Quote on EBL service
To receive a quote, NILT needs a design file and supporting information enabling NILT to simulate the EBL writing time and to calculate an exact price.
In order for NILT to simulate the exact price, the design file in GDSII or DXF format must fulfill the following specifications:
- The design file must contain all objects in the design in the correct dimensions and layout.
- All objects in the design file must be polygons with maximally 199 vertices – no circular objects or line objects are allowed.
All design files handed over to NILT are kept strictly confidential and all design file data will be deleted upon customer request.
The design file can be emailed to NILT,
, or it can be uploaded to a dedicated ftp server. The ftp server information can be obtained upon request. |
