The NanoLithoSolution (NLS) nanoimprint module is a low cost tool used as add-on to existing UV-lithography mask aligners. The module is easily installed, has integrated Auto-Release™ and comes with all needed features for imprinting.
When combined with a conventional optical mask aligner, the system prvides a semiautomatic nanoimprint with precision alignment capability for anyone using a traditional photolithography process. The equipment is compatible with most widely available optical aligners in microfabrication facilities around the world.
Turn your UV-aligner into an imprint tool
Easy to use nanoimprint lithography solution for UV aligners
Quick and easy switching between nanoimprint and normal UV aligner function
No extra cleanroom space needed
Simple and robust process
Allowing an easy and affordable way into nanoimprint lithography
Features of the NLS imprint module:
No interference with existing UV aligner processes
Patented Auto-Release™ function
Developed at HP Labs
QuickMold™ (polymer) available for creating working stamps
Sub-10 nm feature imprinting demonstrated
Imprints on 4” wafers, up to 2” imprint area in standard configuration
No cleanroom footprint
Overlay alignment (using UV-aligner)
Compatible with several aligners. Contact the NILT team for further details
