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NILT Standard Stamps are stamps with fixed patterns defined by NILT. These stamps are ideal for testing and process optimization.
The Multi-Pattern Standard Stamp is optimal for testing of the nanoimprint process and test of of NIL equipment. This standard stamp comes with line widths down to 50 nm. It has 8 areas with 5 different patterns, each with different line widths and periods. The stamp is offered in both Silicon and Quartz.
Specifications
| Stamp size |
2 inch round wafer |
| Stamp material |
Quartz (Fused Silica) or Silicon |
| Stamp thickness |
500 µm +/- 25 µm |
| Structure size |
50 nm - 300 nm |
| Protrusion height |
100 nm +/- 15% |
| Line width tolerance |
50 nm: +/- 30% , 100 nm: +/- 20%, 150-300 nm: +/- 15% |
| Defect density |
Less than 0.1% of total patterned area |
Anti-sticking layer (ASL) and dicing are optional
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Image - Si/Qz Multi-Pattern Standard Stamp
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| Click to enlarge |
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